The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 1998
Filed:
Sep. 11, 1996
Applicant:
Inventors:
Clark Bergman, Roseville, MN (US);
Thomas M Crook, New Brighton, MN (US);
Assignee:
Honeywell Inc., Minneapolis, MN (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118720 ; 118504 ; 427282 ; 427585 ;
Abstract
A substrate holder and mask system for depositing curved films and mirrors on flat mirror substrates. A spherical mask is held in close proximity to a substrate by a support structure to intercept a fraction of vapor from a distant source. The film deposited on the substrate behind the mask has a spherically symmetric curvature when the source has a large area. The cross section of the mask support structure is made as small as possible to minimize irregularities in the spherical figure. A mirror is subsequently deposited on said curved substrate after removing said mask.