The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 1998
Filed:
Feb. 20, 1996
Applicant:
Inventors:
Assignee:
Institute for Advanced Engineering, Seoul, KR;
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
445 24 ;
Abstract
The invention is to provide the method for fabricating the spacers which are mechanically strong and have lower outgassing rate. Spacers in this invention are made of photosensitive glass. A net shaped photosensitive glass is etched by a first photolithography process and then the side wall of it is etched again by a second photolithography process for improving the efficiency of evacuation of the internal cavity of an FED.