The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 1998
Filed:
Feb. 28, 1991
Applicant:
Inventors:
Paul Ehrlich, Buffalo, NY (US);
Robert Bruce Stewart, Cheektowaga, NY (US);
Assignee:
Research Foundation of State University of New York, Albany, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J / ;
U.S. Cl.
CPC ...
521 61 ; 264 41 ; 264 65 ; 264 66 ; 521 64 ; 521 97 ; 521 98 ; 521142 ; 521143 ; 521145 ; 528491 ; 528497 ; 528498 ; 528501 ; 528502 ; 528503 ;
Abstract
The disclosed invention is a crystalline microporous polymer and process for preparing a low density microporous polymer comprising, providing a mixture of a polymer and a polymer solvent, the mixture capable of achieving a supercritical condition; applying pressure, at a temperature sufficient for the mixture to attain a super critical condition; cooling the supercritical solution that results and precipitating a microporous crystalline polymer product.