The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 1998
Filed:
Apr. 24, 1992
Rikio Ikeda, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
A phase-shifting mask having a light shielding portion, a light permeation portion and a phase-shifting portion on a transparent substrate is manufactured by forming a negative resist layer to the entire surface on a transparent substrate formed with a light shielding material pattern, applying exposure from the rearface of the transparent substrate, followed by applying development to leave the negative resist layer on the light permeation portion, then further continuing development for the negative resist layer to reduce the width and form a sub-space between the negative resist layer and the light shielding portion, to obtain a phase-shifting portion easily and at a high accuracy. The phase-shifting portion can be formed by an easy and simple step under a good controllability free from of the problems of mask alignment between each other.