The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 1998
Filed:
May. 07, 1996
Hirohiko Shinonaga, Utsunomiya, JP;
Hiroshi Sato, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A projection exposure apparatus including structure for supplying illumination light, using a projection optical system for projecting a pattern of a first object onto a second object in cooperation with the illumination light, the projection optical system having a refraction optical element, controlling a changing unit (for changing a wavelength of illumination light) on the basis of an output of a detecting unit (for detecting a change in pressure around the projection optical system) so as to compensate a change in ratio, or so as to maintain a constant ratio, of reflective index between an atmosphere and the refraction optical element due to a change in pressure, and correcting a change in optical characteristic of the projection optical system, due to a factor other than the pressure change, without use of the wavelength changing unit; and a device manufacturing method including a step of projecting and transferring a device pattern of a mask onto a substrate by using the projection exposure apparatus.