The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 1998

Filed:

Sep. 13, 1996
Applicant:
Inventors:

Yoichiro Nakanishi, Ikeda, JP;

Takako Honjoh, Ikeda, JP;

Kuniaki Honjo, Ibaraki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J / ;
U.S. Cl.
CPC ...
502416 ; 423445 ; 4234471 ; 4234472 ; 423460 ; 502180 ;
Abstract

A surface hydrophobic active carbon is disclosed which has undergone a treatment with trimethyl chlorosilane and exhibits a silicon concentration on the surface thereof, Si.sub.2p /C.sub.1s, in the range of 0.005-0.03 as determined by X-ray photoelectron spectroscopy and a humidity for starting adsorption of water in the range of 45-60% as determined from the equilibrium adsorbed water content curve, and a method for the production of a surface hydrophobic active carbon is disclosed which comprises exposing active carbon to trimethyl chlorosilane, allowing the exposure to continue for a prescribed length of time, evacuating the ambience, thereby removing excess amount of trimethyl chlorosilane, and subsequently heating the active carbon under a vacuum.


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