The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 1998
Filed:
Jun. 28, 1996
Applicant:
Inventors:
David W Walters, Walworth, NY (US);
Susan S Collier, LeRoy, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427240 ; 427162 ; 4273855 ;
Abstract
A substrate is rotated at a first bead of less than or equal to 500 rpm per second. A coating composition solution is applied to the substrate at this point. The substrate is then accelerated at a first rate of between 300 and 1200 rpm per second. When the speed of the substrate reaches approximately 3000 rpm per second, a second acceleration is initiated at a second rate of greater than or equal to 3000 rpm. The coating composition is set and the substrate is decelerated. This process provides a more conformal coating of the composition providing better push-pull unwritten variability.