The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 1998
Filed:
May. 04, 1995
Michel Ida, Voreppe, FR;
Patrick Chaton, Tencin, FR;
Commissariat a l'Energie Atomique, Paris, FR;
Etat Francais (represente par le Delegue General pour l'Armement, Armees, FR;
Abstract
A high reflectivity, broad band mirror for a high flux laser and a process for producing such a mirror. The mirror includes a substrate on which is formed a metallic layer such as aluminum. A stack of layers are formed on the metallic layer. The stack includes alternating layers of two materials with the refractive index of one material being higher than that of the other. A surface layer of a third material is placed on the stack. The surface layer has a refractive index which varies in accordance with the continuous periodic profile. The mirror is formed by depositing the metallic layer on a substrate and forming the stack by an ion beam sputtering method.