The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 1998
Filed:
Jul. 22, 1997
Kevin G Harding, Ann Arbor, MI (US);
Insutrial Technology Institute, Ann Arbor, MI (US);
Abstract
A moire interferometry system and method are provided for achieving full field surface contouring with an extended depth of view of image. The moire interferometry system includes a projection system generally made up of a light source, imaging lens and a square wave grating pattern. The imaging lens is configured to filter higher order light rays passing through the square wave grating pattern so as to project a sine wave like pattern onto a desired surface. The moire interferometry system also includes a viewing system generally made up of an imaging lens, a submaster grating and a camera. The submaster grating is preferably a customized grating that may be produced by recording a grating pattern in relation to a reference surface. The camera is able to view an image anywhere within the extended depth of image and analyze the moire fringes. A determination of deviation between a test part and a reference surface provides a part inspection system.