The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 1998
Filed:
Jun. 06, 1997
Applicant:
Inventor:
Paul Derek Coon, Redwood City, CA (US);
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
2504922 ; 250398 ;
Abstract
Thermal expansion caused by the absorption of thermal energy from exposure dosages can cause misalignment and other problems in the exposure process. The present invention compensates for this problem by developing scaling and backlash coefficients based on the amount of amount of energy absorbed by the substrate undergoing the exposure process. Scaling and backlash are then compensated for in the alignment map which controls the exposure process. In this fashion, scaling and backlash are accounted for prior to exposure, thus ensuring the proper exposure during the lithography process.