The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 1998

Filed:

Jun. 20, 1997
Applicant:
Inventor:

David K DuBay, Casper, WY (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F42B / ;
U.S. Cl.
CPC ...
102430 ; 102447 ; 102448 ; 102469 ;
Abstract

A high-low pressure ammunition cartridge includes a case containing a gas expansion chamber and a missile chamber separated from each other by a pressure containment wall containing one or more pressure control ports providing fluid communication between the gas expansion chamber and the missile chamber. The gas expansion chamber is located between the pressure containment wall and a base plate pressed into the back end of the case. The pressure containment wall may either be integral with the case or a separate piece which is removable from the case along with the base plate to facilitate reloading of the cartridge thereby reducing the cost of using the cartridge. The thickness of the base plate may be varied for varying the volume of the gas expansion chamber. Also, the thickness of the gas containment wall and number and size of holes in the gas containment wall may be varied for varying the velocity of the gas entering the missile chamber from the gas expansion chamber.


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