The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 1998
Filed:
Jun. 13, 1997
Jun Urasaki, Tokyo, JP;
Toshiyuki Morito, Tokyo, JP;
Masahiko Saikawa, Tokyo, JP;
Yoshikazu Takano, Tokyo, JP;
Eiji Kanada, Tokyo, JP;
Mitsubishi Papers Mills Limited, Tokyo, JP;
Abstract
A method for processing a photosensitive material characterized in that an exposed photosensitive material is subjected to dip coating with a processing solution, according to which there are no problems encountered in plate making by the conventional dip developing method and coating developing method, rapid processing can be attained, maintenance is easy, less waste processing solution is produced, and lithographic printing plates on which uniform print images can be formed from the top end portion thereof by silver complex diffusion transfer process, and an apparatus used for the processing.