The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 1998
Filed:
May. 20, 1996
Edward G Blazejewski, Greenbay, WI (US);
Megtec Systems, Inc., DePere, WI (US);
Abstract
Regenerative thermal oxidizer in which a gas such as contaminated air is first passed through a hot heat-exchange bed and into a communicating high temperature oxidation (combustion) chamber, and then through a relatively cool second heat exchange bed. The apparatus includes a number of internally insulated, ceramic filled heat recovery columns topped by an internally insulated combustion chamber. Process air is fed into the oxidizer through an inlet manifold containing a number of hydraulically or pneumatically operated flow control valves (such as poppet valves). The air is then directed into the heat exchange media which contains 'stored' heat from the previous recovery cycle. The process air is heated to near oxidation temperatures. Oxidation is completed as the flow passes through the combustion chamber, where one or more burners are located. The gas is maintained at the operating temperature for an amount of time sufficient for completing destruction of the VOC's. From the combustion chamber, the gas flows vertically downward through another column containing heat exchange media, thereby storing heat in the media for use in a subsequent inlet cycle when the flow control valves reverse. The resulting clean air is directed via an outlet valve through an outlet manifold and released to atmosphere at a slightly higher temperature than inlet, or is recirculated back to the oxidizer inlet. An integrated VOC entrapment chamber entraps any VOC's that leak out during cycling, and recycles them back to the oxidizer inlet for further processing.