The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 1998

Filed:

May. 20, 1997
Applicant:
Inventors:

Takaaki Tamura, Tokyo, JP;

Mikio Kumagai, Chiba, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
95 98 ; 95101 ; 95102 ; 95105 ; 95127 ;
Abstract

Krypton present in a trace amount in a gaseous oxygen/nitrogen mixture is effectively enriched by an adsorption/desorption process of the pressure variation mode using a system including at least three fixed bed adsorption columns packed with hydrogenated mordenite. At the end of adsorption operation in one column, a desorbed gas from another column is fed to the one column under substantially the same pressure as the pressure during adsorption operation for fully washing the one column. Thereafter, the one column is subject to desorption operation.


Find Patent Forward Citations

Tamura, Takaaki. (1998). Enrichment of krypton in oxygen/nitrogen mix gas (U.S. Patent No. 5833737). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5833737

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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