The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 1998

Filed:

Sep. 08, 1995
Applicant:
Inventors:

Thomas N Clarino, East Haven, CT (US);

Mary McFadden Altshul, South Windsor, CT (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F / ;
U.S. Cl.
CPC ...
36447006 ; 36447003 ; 36447005 ; 178 18 ; 345179 ;
Abstract

A pattern alignment system for use during the garment development process prior to the cutting operation includes a table with work surface. There is a digitizer located with the surface. The operator establishes a perimeter of a hide or other fabric piece that has been positioned on the surface with a stylus that presents position signals to a controller in real time. The controller has signals corresponding to a marker and further includes algorithms to compose the drawn lines or points into an electronic representation of the piece perimeter. Defects, textures or the like in the piece are identified in a similar manner. The system includes algorithms which enable the operator to reposition one or more garment segment patterns in the marker to avoid defects or otherwise optimize the segment position on the piece.


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