The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 1998

Filed:

Oct. 01, 1992
Applicant:
Inventors:

Philippe Ehret, Fortschwihr, FR;

Christophe Rougeot, Colmar, FR;

Herve Brochard, Wittelsheim, FR;

Andre Stamm, Griesheim, FR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B65D / ; A61K / ; A01N / ;
U.S. Cl.
CPC ...
428 361 ; 2065241 ; 206484 ; 220454 ; 222 92 ; 604408 ; 6048901 ;
Abstract

A reservoir system consisting of a nonwoven made from thermoplastic polymer filaments, shaped into a closed bag containing a water-soluble active principle. The bag is intended to ensure a prolonged release, progressing linearly, of the active principle in an aqueous environment. For a given active principle, the desired diffusion kinetics are obtained by adjusting, depending on the availability of the active principle, the surface area of the nonwoven and the degree of hydrophily of the latter. To this end, it is impregnated, either with polysiloxane or a quaternary ammonium salt, or with a perfluorinated compound or an acrylic resin and paraffin.


Find Patent Forward Citations

Ehret, Philippe. (1998). Reservoir system for prolonged diffusion of an active principle (U.S. Patent No. 5830546). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5830546

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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