The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 1998
Filed:
Nov. 22, 1996
Applicant:
Inventors:
Susan Nord Bohlke, Woodbury, MN (US);
Gregory M Jellum, Stillwater, MN (US);
Douglas S Dunn, Maplewood, MN (US);
Andrew J Ouderkirk, Woodbury, MN (US);
Assignee:
Minnesota Mining and Manufacturing Company, St. Paul, MN (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
216 65 ; 216 66 ; 216 67 ; 216 94 ; 1563 / ; 1563 / ; 1563 / ; 427533 ; 427537 ; 427536 ; 427555 ; 438694 ; 438710 ; 438712 ; 438733 ;
Abstract
A maskless process generates a patterned coating on a polymeric substrate, wherein the pattern is at least partially defined by the substrate topography. The process uses a high intensity/high fluence energy source to strike a coated substrate, thus selectively removing a portion of the coating. The amount and area of the coating removed is dependent on the substrate topography and the applied energy, and this forms a pattern of residual coating material on the substrate.