The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 1998
Filed:
Mar. 06, 1997
Kenji Yamamoto, Saitama, JP;
Isao Ichimura, Kanagawa, JP;
Fumisada Maeda, Tokyo, JP;
Toshio Watanabe, Kanagawa, JP;
Kiyoshi Ohsato, Chiba, JP;
Sony Corporation, Tokyo, JP;
Abstract
A method for designing an objective lens apparatus formed by at least two lenses, a first lens and a second lens, which includes the steps of: measuring aberration which occurs when a light beam is converged by the first lens; setting the first lens is set such that the aberration occurring in the first lens satisfies Marechal's criterion, in accordance with the measurement results; measuring aberration which occurs when a light beam is converged by the first lens and the second lens; and setting the second lens such that the aberrations occurring in the first lens and the second lens satisfy Marechal's criterion, in accordance with the measurement results. Accordingly, an objective lens apparatus with a small aberration and a large numerical aperture NA can be designed by this method.