The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 1998

Filed:

Dec. 24, 1997
Applicant:
Inventors:

Osami Tsuji, Kanagawa, JP;

Toshio Kurokawa, Kanagawa, JP;

Hideaki Nomura, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03D / ;
U.S. Cl.
CPC ...
396613 ; 396612 ; 396617 ; 396620 ;
Abstract

A photosensitive material processing apparatus is provided with a loading section for loading therein a film container accommodating a film which is wound from one edge section in the longitudinal section thereof around a spool shaft with the edge section thereof in the longitudinal section separated from the spool shaft for development and also which is returned in the separated state to a customer, said film accommodated therein in the state of being wound around the spool shaft; a feeding device means for feeding the film into the loading section from another edge section of the film wound around the spool shaft and also retaining the film in the state where the former edge section of the film in the longitudinal direction is kept locked in the loading section; and a single processing tank for receiving a portion of the film fed out by the feeding means from the loading section and developing the film with a processing liquid. Therefore, it is not necessary to convey the film in a curved manner in the processing tank.


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