The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 1998
Filed:
May. 30, 1996
Applicant:
Inventors:
Atsushi Tatani, Tokyo, JP;
Makoto Susaki, Tokyo, JP;
Kazuaki Kimura, Tokyo, JP;
Taku Shimizu, Tokyo, JP;
Toshikuni Sera, Hiroshima-ken, JP;
Kenji Inoue, Hiroshima-ken, JP;
Assignee:
Mitsubishi Jukogyo Kabushiki Kaisha, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
422171 ; 422169 ; 422170 ; 422234 ; 422109 ; 422110 ; 55228 ; 55229 ;
Abstract
A gas refining system for adsorbing a reducing gas includes a reduced gas stream, a section for adsorbing and removing sulfur-containing compounds in the reducing gas, an adsorbent which contacts the reduced gas stream, an oxygen-gas containing stream which enters the adsorbing and removing section, a calcium-compound containing stream, and a reactor which receives the above streams and allows for the adsorption of sulfur dioxide and precipitation of a gypsum compound.