The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 1998
Filed:
Jun. 05, 1996
Applicant:
Inventor:
Yoichiro Tanaka, Narita, JP;
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20419212 ; 20429811 ; 20429819 ;
Abstract
A target shield having a concave, curved surface away from a target in a physical vapor deposition chamber spaced so that the number of magnetic field lines that intersect said shield are reduced, results in improved vertical directionality of the sputtered material. High aspect ratio openings in a substrate can be filled at low pressures, e.g., 3 millitorr and lower, using this shield.
Tanaka, Yoichiro. (1998). Shield for a physical vapor deposition chamber (U.S. Patent No. 5824197). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5824197
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