The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 1998
Filed:
Aug. 08, 1996
Takashi Murai, Fukaya, JP;
Masatsugu Inoue, Kumagaya, JP;
Nobuhiko Akoh, Gumma-ken, JP;
Kumio Fukuda, Fukuya, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
A color cathode ray tube has a substantially rectangular shadow mask in which a plurality of slit type aperture arrays are aligned in the direction of the major axis of an effective region defined by a curved surface opposing a phosphor screen formed on the inner surface, defined by a concave curved surface, of the effective region of a panel. Each slit type aperture array is obtained by arranging a plurality of slit type apertures in an array in the direction of the minor axis of the effective region of the shadow mask. In this color cathode ray tube, the difference between the array interval of the slit type aperture arrays at a peripheral portion on the long side of the shadow mask and the array interval of the slit type aperture arrays on the major axis is a maximum value within a distance range of 0.4 h to 0.9 h (h is 1/2 the length of the effective region of the shadow mask in the direction of the major axis) from the minor axis, and the array interval of the slit type aperture arrays at the end of the major axis is larger than that of the slit type aperture arrays at a corner. Thus, local doming of the shadow mask can be suppressed.