The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 1998
Filed:
Mar. 04, 1997
Harunobu Hirano, Nagasaki, JP;
Yasushi Kusano, Nagasaki, JP;
Rikio Ikeda, Kanagawa, JP;
Ritsuko Inoue, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
A developing apparatus used for developing a resist applied on a substrate, comprises: developer storage means for storing a developer; a developer supply tube for supplying the developer from the developer storage means through one end thereof onto a substrate supported in a position; and degas means located immediately upstream of the one end of the developer supply tube to deaerate the developer. A resist developing method comprises the steps of: supplying a substance; applying a resist onto the substrate; making a latest image in the resist; and supplying a developer onto the resist having the latest image to develop the resist, wherein the step of supplying the developer provides the developer in several times. Another resist developing method comprises the steps of: supplying a substrate; applying a resist onto the substrate; forming a latest image in the resist; providing a developer onto the resist having the latest image therein; after providing the developer, rotating the substrate and then stopping same; maintaining the substrate still; and rotating the substrate and then stopping same.