The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 1998
Filed:
Nov. 25, 1994
Applicant:
Inventors:
Douglas Cromack, Menlo Park, CA (US);
Mark L Goodwin, Santa Cruz, CA (US);
James M Poplett, Golden Valley, MN (US);
Robert Tong, Fridley, MN (US);
Assignee:
Pinnacle Research Institute, Inc., Los Gatos, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430311 ; 430330 ; 430396 ;
Abstract
The present invention relates to a photolithographic method to produce multiple, electrically insulating microprotrusions on an electrically conducting substrate to produce and maintain substantially uniform space separation between the substrates which act as electrodes in a double layer capacitor or battery configuration. Preferably, the electrically insulating microprotrusions are an organic photocurable epoxide polymer, a photocurable acrylic polymer or combinations thereof.