The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 1998
Filed:
Dec. 13, 1996
Gayle W Miller, Colorado Springs, CO (US);
Brian R Lee, Colorado Springs, CO (US);
Symbios, Inc., Fort Collins, CO (US);
Abstract
A method and apparatus for forming layers of photo-sensitive materials in different thicknesses. A mask including a first area that substantially blocks light transmission and a second area having optical characteristics, which partially blocks light transmission is employed. Light is projected through the mask onto a layer of photo-sensitive material. The first area substantially blocks the light from passing through and leaves portions of the photo-sensitive material unexposed. The secondary area reduces the intensity of light passing through the mask and projected onto other portions of the photo-sensitive material. After developing the photo-sensitive material, at least two thicknesses of photo-sensitive material results. The second area may include a number of sections that vary from each other in optical characteristics such that the intensity of the light projected onto the layer of photo-sensitive material through the second area varies in steps or continuously.