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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 5820688 B1

PDFFull Text
Date of Patent:
Oct. 13, 1998

Filed:

Apr. 25, 1997

Method for the treatment of semiconductor material

Applicant:
Inventors:

Franz Koppl, Erlbach, DE;

Friedrich Steudten, Burghausen, DE;

Matthaus Schantz, Reut, DE;

Assignee:

Wacker-Chemie GmbH, Munich, DE;

Attorney:

Collard & Roe, P.C.

Primary Examiner:

Jill Warden

Assistant Examiner:

Alexander Markoff

Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134-2 ; 134-3 ; 134 16 ; 134 251 ; 134 34 ; 134902 ;
Abstract

A method for the treatment of semiconductor material in a liquid bath has the treatment based upon the occurrence of cavitation being brought about in the liquid bath. The semiconductor material is contacted with a cavitating liquid in order to clean fragments of the semiconductor material and to round fracture edges of the fragments.

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Koppl, Franz. (1998). Method for the treatment of semiconductor material (U.S. Patent No. 5820688). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5820688

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