The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 1998

Filed:

Dec. 27, 1996
Applicant:
Inventors:

Satoru Kurosawa, Tokyo, JP;

Yoshikazu Ishii, Tokyo, JP;

Kiyoshi Horii, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
356316 ; 250288 ;
Abstract

In an elemental analysis method of analyzing a sample as an analysis target using atoms generated upon dissociation of the sample, a plasma is generated using a gas serving as a plasma source to be supplied in a torch having a conical cylinder thereof. A sample flow obtained by evaporating the sample using the gas as a carrier gas or a sample flow containing a component of the sample is supplied to the plasma. The sample flow or the plasma containing the sample flow is changed into a spiral flow, and the component of the sample is dissociated. The sample is analyzed in accordance with the state of an atom generated by dissociation of the component of the sample. An elemental analysis apparatus is also disclosed.


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