The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 1998
Filed:
Jul. 10, 1997
Applicant:
Inventors:
Richard W Baker, Palo Alto, CA (US);
Shannon Goakey, Hillsboro, OR (US);
Douglas Gottschlich, Mountain View, CA (US);
Assignee:
Membrane Technology and Research, Inc., Menlo Park, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07D / ;
U.S. Cl.
CPC ...
549513 ;
Abstract
A process and apparatus for ethylene oxide production. A membrane unit containing a membrane selectively permeable to ethylene over argon is used to recover ethylene from the argon purge stream.
Baker, Richard. (1998). Membrane process for argon purging from ethylene oxide reactors (U.S. Patent No. 5817841). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5817841
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile