The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 1998
Filed:
Jun. 13, 1996
Nitto Denko Corporation, Osaka, JP;
Abstract
A fluorine-containing polyimide gas separation membrane which is pinhole-free, uniform over a large area, and has a high permeability and a high separation factor .alpha. is provided. A polyimide resin is dissolved in at least one solvent selected from the group consisting of an organic solvent (A) or (B). The organic solvent (A) has a dielectric constant of 30 or less and a dipole moment of 3.0 D or less. The organic solvent (B) mainly contains an organic solvent having at least one ether bonding in the molecular unit. In the next step, the polyimide resin is dipped in a solvent (C) in order for desolvation. The solvent (C) does not dissolve the fluorine-containing polyimide resin while it is miscible with the organic solvent (A) or (B). As a result, an asymmetric gas separation membrane is formed. The fluorine-containing polyimide resin layer comprises a skin layer the thickness L.sub.1 thereof is about 40 nm and a sponge like layer the thickness L.sub.2 thereof is about 30 .mu.m. The membrane is formed on a supporter of, for example, a nonwoven cloth.