The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 1998
Filed:
Sep. 15, 1995
Kazuya Kamon, Tokyo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
An apparatus and method corrects for light proximity effects in exposure of a resist material. A circuit pattern to be formed on the wafer is defined by design data and that data is compressed for processing. The data is employed to prepare an optical projection image for transferring the circuit pattern onto the wafer. Before the pattern is transferred, the size of the pattern on the wafer that will result is predicted, using the optical projection image. The predicted pattern size is compared to the desired pattern size and, if there is sufficient difference, the compressed design data is corrected to produce the desired circuit pattern. Thereafter, the design data that has been corrected is expanded and output for use in the pattern transfer by light exposure using a mask produced according to the invention.