The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 1998
Filed:
Jun. 27, 1996
Shoichi Iwasa, Tokyo, JP;
Nippon Steel Corporation, Tokyo, JP;
Abstract
A semiconductor device has a memory cell array and a filtering capacitor for suppressing noise in a power supply voltage to the device, both formed with one and the same semiconductor substrate. The memory cell array includes memory cells each having a transfer transistor and an information storage capacitor. The transistor of each memory cell has a pair of source/drain regions formed in an active region defined by first isolation regions in a main surface of the semiconductor substrate. Lead electrodes are formed on the source/drain regions. The information storage capacitor of each cell has a lower electrode formed in an electrical connection with a first one of the pair of source/drain regions, a dielectric film and an upper electrode formed on the dielectric film. The filtering capacitor is formed on a second isolation region also formed at the main surface of the semiconductor substrate and has a dielectric layer including an oxide film and a nitride film. The second isolation region has a structure substantially identical with that of the first isolation regions and is arranged at the same film-formation-step level as that of the first isolation regions.