The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 1998

Filed:

Dec. 05, 1996
Applicant:
Inventors:

Eui Won Choe, Randolph, NJ (US);

Masayuki Arai, Hofheim, DE;

Marie Borzo, Basking Ridge Township, NJ (US);

Assignee:

Hoechst Celanese Corp., Somerville, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L / ;
U.S. Cl.
CPC ...
525431 ; 524538 ; 525931 ;
Abstract

This invention discloses a novel process to prepare multi-block copolymers with high molecular weights from two immiscible polymer segments. In one embodiment, the two polymer segments are reacted in a solvent mixture which comprises N-methyl-2-pyrrolidinone and diglyme. Such polymers are useful for alignment layer applications in display devices.


Find Patent Forward Citations

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Choe, Eui. (1998). Polymerization medium to prepare multi-block copolymers (U.S. Patent No. 5814711). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5814711

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