The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 1998
Filed:
Sep. 26, 1996
Christine C Wolcott, Horseheads, NY (US);
Corning Incorporated, , US;
Abstract
Methods for producing thin colloidal silica films on substrates, such as corona treated polystyrene, are provided. The dried films are characterized as 50 nm thick, high silanol, homogenous, high surface area, porous, uncracked, adherent, wetting, negatively charged, and gamma radiation stable. Several differential advantages of the colloidal silica films were demonstrated in epithelial cell culture, especially regarding primary cultures in serum free media. Cell responses to the films were increased explant adhesion, increased cell growth rate, and increased expression of differentiated function before and after subculture as compared to tissue culture polystyrene.