The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 1998
Filed:
Sep. 26, 1996
Chong-Dae Park, Daejeon, KR;
Electronics and Telecommunications Research Institute, Daejeon, KR;
Korea Telecommunication Authority, Seoul, KR;
Abstract
A method for forming a deflection grating is disclosed, includes the steps of: sequentially forming a dielectric layer and photoresist layer on a compound semiconductor substrate, and patterning the photoresist layer through optical holography to expose the dielectric layer; removing a portion of the dielectric layer on which the patterned photoresist layer is not formed, through RIE using the patterned photoresist layer as a mask; anisotropically etching a portion of the semiconductor substrate on which the dielectric layer is not formed, through RIE using the dielectric layer as a mask, to form a deflection grating; and removing the dielectric layer.