The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 1998

Filed:

Oct. 31, 1995
Applicant:
Inventors:

Kimishige Nakamura, Ibaraki, JP;

Hiroshi Ishida, Akashi, JP;

Akio Ohsaki, Niihama, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J / ; G01J / ;
U.S. Cl.
CPC ...
356369 ; 356327 ; 250225 ;
Abstract

A method of measuring surface reflectance of a polarizing film product and for producing an antireflective polarizing film. The method includes placing a linear polarizer between a polarizing film product and a light supplying part, and measuring light reflected by the surface of the film.


Find Patent Forward Citations

Nakamura, Kimishige. (1998). Method of measuring surface reflectance and a method of producing (U.S. Patent No. 5812264). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5812264

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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