Photoconductive switching with thin layer enhanced breakdown

Abstract

A high voltage high current semiconductor switching device in which the tendency to incur premature electrical breakdown through carrier channels formed slightly below the surface of the semiconductor material is avoided. This avoidance occurs through use of a current dispersing electrically insulating element added at one extremity of the switching device structure. The added current dispersing element may be in the form of a thin oxide layer added at the anode end of the device in the case of a silicon embodiment of the invention. Tunneling conduction is believed to occur in this silicon dioxide layer and such conduction has the effect of dispersing the current through the silicon over a cross-sectional area sufficiently large to prevent the current filamentation, localized heating, thermal runaway and self destruction sequence often encountered in previous arrangements of higher energy semiconductor switches. Although several semiconductor materials are believed feasible for fabricating the device, a silicon material embodiment is primarily disclosed.