The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 1998
Filed:
Jul. 17, 1995
Applicant:
Inventors:
Takashi Watabe, Yokohama, JP;
Hiroshi Hatano, Yokohama, JP;
Kazunori Chiba, Yokohama, JP;
Takao Doi, Yokohama, JP;
Toru Ueno, Yokohama, JP;
Etsuko Sakai, Yokohama, JP;
Minoru Yamada, Yokohama, JP;
Shinya Saiki, Yokohama, JP;
Hirotsugu Yamamoto, Yokohama, JP;
Toshihiko Higuchi, Yokohama, JP;
Assignee:
Asahi Glass Company Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C07F / ;
U.S. Cl.
CPC ...
556445 ; 568699 ;
Abstract
A process for purifying a polyether, which comprises adding to a polyether (A) containing a first salt, water (B) and a compound (C) which is capable of reacting with an ion constituting the first salt to form a second salt which is essentially insoluble in the polyether (A), then removing water, followed by removing the second salt from the polyether (A).