The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 1998

Filed:

Oct. 10, 1996
Applicant:
Inventors:

Chieh-Min Cheng, Rochester, NY (US);

Rong-Chang Liang, Newton, MA (US);

Yi-Hua Tsao, Waltham, MA (US);

Assignee:

Polaroid Corporation, Cambridge, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430302 ; 101456 ; 101457 ;
Abstract

The present invention provides a method for developing a lithographic plate on a printing press without the requirement of bath processing, the printing press equipped with means for delivering ink and aqueous fountain solutions to the plate, the preferred plate having in order (a) a substrate; and (b) a photoresist photohardenable upon imagewise exposure to actinic radiation, the photoresist comprising (i) a macromolecular organic binder; (ii) a photopolymerizable ethylenically unsaturated monomer having at least one terminal ethylenic group capable of forming a high polymer by chain-propagated polymerization, (iii) a polymerization initiator activatable by actinic radiation, and (iv) a disperse hydrophilic microgel. According to a product aspect, the present invention also provides a lithographic plate, configured as indicated, with the further combination therewith of an on-press removable polymeric overcoat.


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