The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 1998
Filed:
Oct. 02, 1992
Michio Kurata, Tokyo, JP;
Toshio Modegi, Tokyo, JP;
Hideki Murota, Tokyo, JP;
Eisuke Arai, Miyoshi-machi, JP;
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
An abstract pattern plate-making system removes an undesired pattern from an endless pattern in the process for making a plate for printing abstract patterns on architectural materials. For this purpose, it has a scramble processing part 10 and a pixel copy processing part 11. The scramble processing part 10 divides endless pattern data into blocks and repeats processing in which pattern data in two blocks selected at random from among the divided blocks are combined together by a composition technique using mask data having a predetermined pattern, thereby removing an undesired pattern. The mask pattern size may be either smaller or larger than the block size. The mask pattern may be a multi-valued pattern. Further, when the endless pattern is divided into blocks, the blocks may be allotted so as to be a little offset from the endless pattern. The pixel copy processing part 11 first prepares mask data on the basis of designated pattern data in the endless pattern data and then repeats processing in which pixel data at a designated position is copied to another designated position on the basis of the prepared mask data, thereby removing an undesired pattern.