The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 1998
Filed:
Nov. 08, 1996
Seung-hak Choi, Sungnam, KR;
Kil-su Eo, Seoul, KR;
Samsung Electronics Co., Ltd., Kyungki-do, KR;
Abstract
A real-time rendering method for selectively performing bump mapping and Phong shading processes and a rendering apparatus therefor are provided. The rendering method includes the step of calculating a ambient factor, the step of bump-mapping a diffuse factor and selectively outputting the bump-mapped diffuse factor or the diffuse factor prior to the bump mapping according to a bump mapping/Phong shading selection signal, the step of bump-mapping a specular factor and selectively outputting the bump-mapped specular factor or the specular factor prior to the bump mapping according to the bump mapping/Phong shading selection signal and the step of summing the ambient factor, the selectively output diffuse factor and the selectively output specular factor and obtaining the value of intensity. Therefore, bump mapping and Phong shading processes are selectively performed. Also, there is no discontinuity at the borders of each polygon. In addition, the rendering apparatus can be easily realized due to its simple structure.