The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 1998
Filed:
Dec. 20, 1995
Toru Watanabe, Toyama, JP;
Abstract
A transversal SAW filter capable of reducing the effect of diffraction to achieve desired transmission characteristics without increasing the size of the surface wave substrate includes first and second IDTs arranged on a surface wave substrate so as to be spaced from each other by a predetermined distance. The first IDT has a plurality of impulses and the impulse in the 2n-th (n is a natural number) position counted from an impulse located at a maximum cross length in the 0-th position toward the second IDT has a magnitude which is equal to a magnitude of the (2n-1)-th impulse multiplied by -1.0.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile