The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 1998
Filed:
May. 27, 1997
Applicant:
Inventor:
David H Holkeboer, Liverpool, NY (US);
Assignee:
Leybold Inficon Inc., East Syracuse, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2504 / ; 250427 ; 250283 ;
Abstract
A dual beam ion source comprises an ion volume in an ion chamber, an ion collector, and two identical ion accelerators. One ion accelerator accelerates a first, 'test' ion stream from the ion volume in a first direction and directs it to the ion collector where it can be directly measured. The second ion accelerator accelerates a second, 'utilizable' ion stream from the ion volume in a second direction. By directly measuring the ion current (caused by the first, 'test' ion stream) at the ion collector, either or both the total ion pressure of the gas within the ion volume, and the magnitude of the second, 'utilizable' ion stream, can be calculated.