The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 1998
Filed:
Nov. 19, 1996
Applicant:
Inventor:
Kazuhiro Takeda, Tokyo, JP;
Assignee:
NEC Corporation, , JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ;
Abstract
A photo mask has optical filters on transparent portions of a transparent substrate exposed to openings formed in a photo shield layer, and the optical filters are formed from a photo polymerization material layer in such a manner as to have different thickness depending upon the size of the openings, thereby decreasing the transmittance of the optical filters inversely proportional to the size of the openings.
Takeda, Kazuhiro. (1998). Photo-mask having optical filtering layer on transparent substrate (U.S. Patent No. 5807648). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5807648
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile