The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 1998
Filed:
Aug. 12, 1996
Applicant:
Inventors:
Lee R Estelle, Rochester, NY (US);
Barbara J Kouthoofd, Rochester, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B / ;
U.S. Cl.
CPC ...
359677 ;
Abstract
A lens system has nominal focal length and aberrations and includes a plurality of lens components defined by design parameter values and a special airspace distance. The lens system is characterized in design such that manufacturing deviations from the design parameter values cause a variation from the nominal focal length and a variation in at least one of the aberrations. Both of these deviations can be offset simultaneously by a single change in the special airspace distance.