The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 1998
Filed:
May. 15, 1997
Yoshitomo Nakagawa, Chiba, JP;
Seiko Instruments Inc., Chiba, JP;
Abstract
A plasma ion source mass analyzer composed of: a plasma ion source for ionizing a sample in a plasma; a vacuum vessel; a sampling cone and a schema cone each having a front end provided with a hole for passage into the vacuum vessel of a beam of ions generated in the plasma, the holes in the cones defining an inlet axis of the beam; a mass filter disposed in the vacuum vessel for mass-separating ions in the beam; an ion lens disposed in the vacuum vessel to lead ions in the beam to the mass filter, the ion lens having an entrance which subtends a solid angle relative to a point in the hole of the schema cone; an extraction electrode disposed in the vacuum vessel between the schema cone and the ion lens to lead ions passing through the schema cone to the ion lens; a gate valve disposed between the extraction electrode and the ion lens; a detector set in the vacuum vessel to detect ions which pass through the mass filter; and a diaphragm mounted within the extraction electrode for narrowing the beam which passes through the hole in the schema cone to cause the beam to subtend a solid angle, relative to the point in the hole of the schema cone, which is less than the solid angle subtended by the entrance of the ion lens.