The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 1998
Filed:
Jul. 28, 1997
Applicant:
Inventor:
Danny D Yang, San Diego, CA (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427130 ; 427131 ; 427132 ; 427548 ; 427599 ;
Abstract
A method of fabricating a stable, self-biased paired MR (magnetoresistive) sensor comprising the steps of depositing a first MR film with a diffusion barrier layer on either side on a substrate; depositing an oxide passivation/spacer layer on top of the first MR structure; depositing a second MR film with a diffusion barrier layer on either side on the spacer layer; depositing an oxide passivation layer on top of the second MR structure; wherein the MR films are deposited with induced uniaxial anisotropy; and thermal annealing both MR films to stabilize their anisotropy field.