The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 1998
Filed:
May. 09, 1995
Applicant:
Inventor:
Marinus A Van Den Brink, Eindhoven, NL;
Assignee:
ASM Lithography, Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356358 ; 356363 ; 356400 ;
Abstract
A method is described for repetitively imaging a mask pattern, on separate fields of a substrate (W), for example, for IC manufacture, which substrate fields are positioned without any field-by-field alignment so that the speed of throughput of substrates can be increased. An accurate interferometer system (50, 100, 150) having five measuring axes (MAX.sub.1, MAX.sub.2, MAX.sub.3, MAX.sub.4, MAX.sub.5) is also described, which system is intended in the first instance for use in an apparatus for performing the method, but which can also be used in a more general way in those cases where an object must be measured in five degrees of freedom.