The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 1998
Filed:
Jun. 07, 1995
Kenneth Robert Hollister, Wayne, PA (US);
Kenneth Edmund Keller, Wayne, PA (US);
Dong Wei, Wayne, PA (US);
Xin Peng, Wayne, PA (US);
David Lee Ladd, Wayne, PA (US);
Paul Mark Henrichs, Houston, TX (US);
Robert Allen Snow, West Chester, PA (US);
Nycomed Imaging AS, Oslo, NO;
Abstract
The invention provides polymeric polychelants containing polymer repeat units of formula �L--Ch--L--B! (where Ch is a polydentate chelant moiety; L is an amide or ester linkage; B is a hydrophobic group providing a carbon chain of at least 4 carbon atoms between the L linkages it interconnects) or a salt or chelate thereof, with the proviso that where Ch is 2,5-biscarboxymethyl-2,5-diazahex-1,6-diyl, the polychelant is metallated with lanthanide or manganese ions or B provides a carbon chain of at least 10 carbon atoms between the L linkages it interconnects and their salts and chelates. The paramagnetic polychelates of the polychelants of the invention have remarkably high R.sub.1 relaxivities.