The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 1998

Filed:

Dec. 18, 1996
Applicant:
Inventor:

Suk-Bin Han, Choongcheongbuk-Do, KR;

Assignee:

LG Semicon Co., Ltd., Choongcheongbuk-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
1341041 ; 1341044 ; 134902 ; 134155 ; 134186 ; 134109 ; 134201 ;
Abstract

An improved apparatus for cleansing a semiconductor wafer which is capable of effectively removing the foreign substances from the wafer mounting grooves formed in the boats and the outer surface of the boat, for thus enhancing the reliability of the products. The apparatus includes an outer tub having a first cleansing liquid supply tube for supplying a cleansing liquid therethrough and a discharge tube for discharging the cleansing liquid therethrough, an inner tub disposed within the outer tub, a baffle plate disposed within the inner tub for distributing the cleansing liquid supplied to a wafer, a boat disposed on the baffle plate, on which boat a wafer is mounted, a foreign substance extraction tube disposed in a wafer support position of the boat for introducing the foreign substances formed in the interior of the inner tub thereinto and for discharging the same to the outside, and a second cleansing liquid supply tube for supplying the cleansing liquid to the foreign substance extraction tube.


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