The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 1998

Filed:

Oct. 10, 1996
Applicant:
Inventors:

George Norris Foster, Bloomsbury, NJ (US);

Tong Chen, Neshanic Station, NJ (US);

Scott Hanley Wasserman, Bridgewater, NJ (US);

Day-Chyuan Lee, Doylestown, PA (US);

Stuart Jacob Kurtz, Martinsville, NJ (US);

Laurence Herbert Gross, Bridgewater, NJ (US);

Robert Harold Vogel, Ringoes, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G08F / ; G08F / ; G08F / ;
U.S. Cl.
CPC ...
526352 ; 526127 ; 526129 ; 526160 ; 526348 ; 5263482 ; 5263484 ; 5263485 ; 5263486 ; 526901 ;
Abstract

An ethylene polymer having a Polydispersity Index of at least about 3.0, a melt index, MI, and a Relaxation Spectrum Index, RSI, such that (RSI)(MI.sup..alpha.) is greater than about 26 when .alpha. is about 0.7, and a Crystallizable Chain Length Distribution Index, L.sub.w /L.sub.n, less than about 3 is provided. Such ethylene polymer has processability equivalent or superior to even conventional high pressure polyethylene at similar melt index, yet need not be made under high pressure reaction conditions.


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